Original Date: 03/17/1997
Revision Date: 01/18/2007
Information : Ozone Depleting Substance Elimination
Prior to 1992, Polaroid cleaned more than 400 different part types for multiple camera assemblies using a freon material as a routine corrective action for any kind of parts cleaning or rework problem. As a result of the Clean Air Act, Polaroid began eliminating ozone depleting substances (ODSs), such as chlorofluorocarbons (CFCs), from three of its camera manufacturing processes (camera parts cleaning, camera parts coating, and shutterblade coating). In addition, Polaroid instituted a Just Say No More CFCs program and worked with its vendors to improve the cleanliness requirements for parts, and develop air and non-ODS solvent cleaning methods. As a result, Polaroid now receives cleaner camera parts with no negative cost impacts.
To reduce friction between parts, Polaroid used ODSs to coat camera and shutterblade parts with a Teflon material. The Teflon topcoat was applied in an agitated (ultrasonic) dip tank which contained Teflon suspended in a CFC 112 mixture. The new ODS-free process applies the Teflon topcoat to the camera parts in the same ultrasonic dip tank, but now the Teflon material is suspended in an aqueous solution and dried using heated, forced air. The shutterblade parts are now slot-coated by using the Teflon in methyl ethyl ketone. Although it requires a Reasonably Available Control Technology (RACT) Exemption, the process only needs to be performed twice a year to meet all production requirements.
Polaroid has eliminated ODS usage from its manufacturing processes and continually strives to improve its cleaning and coating methods. In addition, Polaroid has successfully used terpene materials to clean optic parts and has developed a no-clean nitrogen atmosphere wave soldering process for electronic assemblies.
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