A representative from the Best Manufacturing Practices (BMP) Program and Center of Excellence (COE) was among attendees at the DoD 2007 Anti-Tamper (AT) Conference held May 1-3, 2007 at the John Hopkins University/Applied Physics Laboratory Kossiakoff Center in Laurel, Maryland.  This year’s meeting, hosted by the Department of the Navy, provided a forum for over 500 conference attendees from government, industry, and academia to discuss and exchange the latest information regarding anti-tamper policy and initiatives.  The three-day event consisted of presentations on acquisition and policy matters related to AT, industry presentations, and AT science and technology initiatives.  BMP’s participation in this event represents the Center’s support of DoD initiatives and best practices information exchange.